top of page
NEWSROOM
Siemens reports over 10 times faster EUV lithography simulation with new technique
Siemens says its new lithography simulation technique is over 10 times faster for EUV lithography simulation and addresses runtime and complexity challenges of leading-edge patterning for AI compute and memory devices.
7 days ago1 min read
ASM International Launches Flowable Carbon Film for Advanced Patterning
ASM International has introduced ASM Flowable Carbon, a PECVD Flowable Carbon film engineered for fill, planarization, and patterning in advanced logic and memory device scaling.
Oct 151 min read
“Image quality remains intact even when stretched like a rubber band”: DGIST develops world’s brightest “stretchable quantum dot display”
A joint team has created the first ultra-high-resolution stretchable quantum dot display that keeps its image sharp while stretching like skin. By chemically bonding quantum dots to an elastic polymer and stamping fine patterns via a new LIFT process, they reached 16,000 pixels per inch and 53,300 nits, far surpassing earlier stretchable devices, with stable operation at 65% elongation. The advance could accelerate commercial wearable displays and electronic skin.
Oct 63 min read
AlixLabs starts six-month APS technology evaluation in NanoIC pilot line
AlixLabs AB has started a six-month evaluation project to assess its APS™ technology for advanced semiconductor patterning within the NanoIC pilot line, coordinated by imec.
Oct 11 min read
bottom of page