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NEWSROOM
Siemens reports over 10 times faster EUV lithography simulation with new technique
Siemens says its new lithography simulation technique is over 10 times faster for EUV lithography simulation and addresses runtime and complexity challenges of leading-edge patterning for AI compute and memory devices.
7 days ago1 min read
Fraunhofer ISIT Supplies Key Chip to IMS Nanofabrication for Mask Writing
Fraunhofer ISIT manufactures specialized semiconductor chips for IMS Nanofabrication's multibeam electron-beam systems, which write photomasks used in EUV lithography at 5 nm and below.
Oct 151 min read
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